露光装置：EXP-2900
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Inner layer patterning of printed circuit boards.
Chemical milling (etching process patterning)
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New LED light source type

New lineup of UV-LED light source type with parallel light. Contributes to energy savings.
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9.5 sec + exposure time (including 2 sec vacuum contact time).

High intensity lamp unit that achieves productivity of [5 panels/minute].

Improved yield with all cleanliness measures.

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Productivity improvement
  • 1/2 the setup time compared to conventional machines.
  • Our unique contact method also enables spacer-less exposure.
Stabilization of accuracy
  • Improved rigidity of exposure frame
  • Temperature and humidity controller unit as standard system
  • Improved performance of collimated light source.
Light Source Variations
  • Light source can be selected according to your application.
  • For patterns: 5 kW short-arc UV lamp collimated light, LED light source collimated light
  • For liquid resist: 7 kW scattered light
Full range of options
  • Camera movement mechanism (reflected light illumination)
  • Top and bottom mask clean rollers
  • When using a short-arc parallel light source, double-line layouts are also possible.
 
Video

Video

Repeat product videos for related systems

movie-exp
Product specification

Product specification

Model type EXP-2900P EXP-2900P-LED EXP-2900S EXP-2900PE
Panel Size 26"x22 ～ 13"x11.8" 24.5"x28.5" ～ 13.5"x16"
Panel Thickness 0.04 mm ～ 2.4 mm 0.04 mm ～ 2.0 mm
Positioning Accuracy ±5 μm (repeatability)
Cycle Time 9.5 sec (including 2 sec vacuum waiting time) + exposure time 11.0 sec (including 2 sec vacuum waiting time) + exposure time
Optical system Collimated light Scattered light Collimated light
Light source Short arc UV lamps 5kW x2 UV-LED unit x2 Metal halide UV lamps 7kWx2 Short arc UV lamps 5kW x2
Intensity uniformity 610 ｘ 510 mm : 90%
660 ｘ 560 mm : 85%		 660 ｘ 560 mm : 85% 610 x 710 mm : 85%
Initial intensity (max) 30 mW/c㎡ 40m W/c㎡ 25 mW/c㎡
Exposure method Vacuum contact method
Transport Method End-face suction pad type transfer
Exposure Chamber Cooling Mechanism Temperature and humidity control unit Refrigeration radiator Temperature and humidity control unit
Equipment Dimensions (main unit) 2620(W) × 2825(D) × 2365(H) mm 2620(W) × 2485(D) × 2365(H) mm 2620(W) × 2824(D) × 2365(H) mm 3200(W) × 2777(D) × 2365(H) mm
  Optional support
Automatic mask cleaning mechanism Built-in clean roller
Camera movement mechanism Supports arbitrary position alignment marks
Mask Type Compatible with glass masks
Low running cost (for 2 lines) Double line layout (P,PE only)

 

Lineup
露光装置：EXP-2031B

EXP-2031B

露光装置：EXP-2500

EXP-2500

露光装置：EXP-2700

EXP-2700

 

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