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For mass production of flexible substrates:
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Video
Video
Repeat product videos for related systems
RDi-10 Duo for Circuit Patterning
RDi-10 Duo for Circuit Patterning
Features:
- Doubles productivity by supporting 2-way flow (in case of simultaneous exposure of 2 x 250mm widths).
- High resolution of 10μm.
- Unique technology enables long circuit patterning in the 20-meter class.
- The introduction of the new system has already proven its effectiveness in the field, such as "making it possible" to produce high-difficulty products and improving yields.
Two-line stream exposure
Substrate: FCCL 250mm wide roll
L/S=15/15μm
Substrate: FCCL 250mm wide roll
Etching Circuit Formation. Curve Formation Capability, PAD Matching
RDi-MP/RDi-MP Duo for circuit patterning
RDi-MP/RDi-MP Duo for circuit patterning
Features:
- FDi optical system for fine patterning is adopted. Equipped with exposure mode switching function (*Refer to FDi).
- RDi-MP Duo supports 2-roll substrate flow.
RDi-80 for solder resist exposure
RDi-80 for solder resist exposure
Features:
- Equipped with UV lamps as light sources, corresponding to the photosensitive wavelengths of solder resists and photosensitive coverlays
Product specification
Product specification
| Light source | Effective exposure size | Substrate width | Resolution | Throughput | Total Overlay Accuracy | |
|---|---|---|---|---|---|---|
| RDi-10 Duo | Semiconductor laser | 635x520mm | 250mm wide x 2 lines (500mm wide x 1 line also available) | 10μm L/S | 38 sec/plane @30mJ MD:500mm | 6μm |
| RDi-MP | Semiconductor laser | 515x260mm | 250mm (*others on request) | 4μm L/S | 45 sec/plan @55mJ MD: 515mm | 3.5μm |
| RDi-MP Duo | Semiconductor laser | 515x590mm | 250mm width x 2 lines (*others on request) | 4μm L/S | 44 sec/plane @50mJ MD:500mm | 3.5μm |
| RDiｰ80 | UV lamp | 635x520mm | 250/500mm | 30μm L/S / Φ80μm | 58 sec/plane @150mJ 69 sec/plane @200mJ MD:610mm | 7μm |